The Effect of Different Dental Adhesive Systems on Hybrid Layer Qualities


  • Ku SH Faculty of Dentistry, University of Malaya, Kuala Lumpur, Malaysia.
  • Tan YS Faculty of Dentistry, University of Malaya, Kuala Lumpur, Malaysia.
  • Yahya NA Biomaterial Technology Research Group and Department of Restorative Dentistry, Faculty of Dentistry, University of Malaya, Kuala Lumpur, Malaysia.



Total-etch, self-etch, hybrid layer, resin tags, adhesive failure, cohesive failure


The study aimed to evaluate the quality of the hybrid layer form by three different adhesive systems. Class V cavities were prepared on the buccal surface of fourty extracted human premolars. The prepared teeth were randomly assigned into four groups according to the adhesive system and application mode. The systems were: Optibond S (OS, total-etch); Optibond Versa (OV, two-bottles, self-etch); Single Bond Universal (SBU, one-bottle, self-etch) and Single Bond Universal with etchant (SBU + etchant). All cavities were restored with composite (Filtek Z350XT). The samples were sectioned, polished and pretreated to remove minerals, protein and water prior to SEM evaluation. From the images, thickness of the hybrid layers was measured. Present of resin tags and adaptation failure were also recorded. The data obtained were analyzed using ANOVA, Dunnett’s T3, Kruskal-Wallis and Mann-Whitney tests. OS group showed the highest average hybrid layer thickness (4.34 μm), followed by SBU + etchant (3.06 μm), OV (1.91 μm) and SBU (0.95 μm). Both adhesive and cohesive failures were observed in SBU group. Present of prominent resin tags were seen in both OS and OV groups. In conclusion, all the investigated adhesive systems were able to perform distinguishable actions as shown in micro-morphological alteration and hybrid layer thickness. Two-bottles, self-etch adhesive (OV) was proven to produce negligible adaptation failure compared to other adhesive systems in the present study. Combined all-in-one adhesive (SBU) was found to render a superior bonding performance in total-etch mode comparing to self-etch mode.


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